• ZYGO ZMI 7714 Laser Head
  • ZYGO ZMI 7714 Laser Head
  • ZYGO ZMI 7714 Laser Head

ZYGO ZMI 7714 Laser Head

Delivery time 3 days

Product origin New/used

Email plcru@foxmail.com

Mobile/wechat /WhatsApp +86 18185397189

The ZYGO ZMI7714 is a high-precision dual-frequency He-Ne helium-neon heterodyne

ZYGO ZMI 7714 Laser Head

The ZYGO ZMI7714 is a high-precision dual-frequency He-Ne helium-neon heterodyne laser emitter, serving as the core light source for ultra-high-precision laser interferometry systems. It features water-cooled temperature control, high frequency stability, and multi-axis measurement compatibility, and is widely used in semiconductor, ultra-precision machining, and nanoscale metrology applications.


Core Parameters:

Light Source Type: Linearly polarized dual-frequency helium-neon continuous laser

Standard Wavelength: 632.8nm red light

Rated Output Power: 2mW

Standard Frequency Difference: 20MHz, Error Range ±1.6kHz

Cooling Method: Integrated water-cooled constant temperature control

Output Beam Diameter: 6mm

Built-in Configuration: Integrated optical isolator to suppress optical path reflection backlash

Compatible Modules: Compatible with ZYGO ZMI2400 and ZMI4004 series measurement decoding modules

Product Features: The entire unit adopts an industrial-grade long-life design, supporting continuous operation in all weather conditions. The water-cooled temperature control architecture precisely locks in the laser's operating temperature, significantly improving long-term frequency stability and measurement repeatability, meeting the requirements for sub-nanometer level displacement, length, and angle precision detection. High-output optical power allows a single unit to drive multiple interferometric measurement optical paths, making it compatible with multi-axis synchronous positioning equipment. Built-in optical isolation reduces the difficulty of on-site optical path debugging, providing excellent resistance to ambient light interference and mechanical vibration, making it suitable for the harsh conditions of high-end precision manufacturing.


Applications: Precision positioning of semiconductor lithography equipment tables; wafer and mask alignment inspection; precision coordinate measurement; laboratory length benchmark calibration; ultra-precision air-floating platforms; closed-loop control of nano-motion mechanisms; high-precision measurement fields such as aerospace precision structure inspection and high-end scientific research physics experiments.

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